Two step annealing process for decreasing contact resistance

Details Two step annealing process for decreasing contact resistance Two step annealing process for decreasing contact resistance

1995-03-14

1996-02-27

Nguyen, Tuan H.

Fishing, trapping, and vermin destroying

437189, 437192, 437194, 437198, 437200, 437247, H01L 2144

Patent

active

054948606

ABSTRACT:
A process for decreasing the electrical resistance of a circuit element containing titanium metal, in applications requiring annealing in hydrogen, is disclosed. The process requires, prior to exposure to hydrogen, heating the titanium-containing circuit element in an inert, hydrogen-free atmosphere. The process thus involves a first step of annealing the titanium-containing circuit element in an inert, hydrogen-free atmosphere, such as nitrogen or other inert gas, at 300.degree. C. to 400.degree. C. for 10 to 60 minutes, followed by a second step of annealing in a hydrogen-containing atmosphere, such as hydrogen gas or forming gas, at 350.degree. C. to 450.degree. C. for at least 20 minutes. The resulting structures have both low resistance and tight variability.

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