Wells – Processes – In situ combustion
Patent
1977-12-09
1979-02-20
Novosad, Stephen J.
Wells
Processes
In situ combustion
166267, 208 11R, 299 2, 423244, E21B 4324
Patent
active
041401816
ABSTRACT:
Sulfur dioxide is removed from a process gas by passing the process gas through a first fragmented permeable mass of particles containing treated oil shale and including alkaline earth metal oxides at a sufficient temperature to remove sulfur dioxide from the process gas. Gas containing sulfur dioxide from the first fragmented mass is passed through a second fragmented permeable mass of particles containing treated oil shale and including alkaline earth metal oxides. Water in the second fragmented mass combines with alkaline earth metal oxides in the second fragmented mass and sulfur dioxide in the gas from the first fragmented mass with resultant removal of sulfur dioxide from gas from the first fragmented mass.
REFERENCES:
patent: 3454958 (1969-07-01), Parker
patent: 3460620 (1969-08-01), Parker
patent: 3460867 (1969-08-01), Cameron et al.
patent: 3499489 (1970-03-01), Parker
patent: 3548938 (1970-12-01), Parker
patent: 3578080 (1971-05-01), Closmann
patent: 3586377 (1971-06-01), Ellington
patent: 3661423 (1972-05-01), Garret
patent: 3969089 (1976-07-01), Moss et al.
patent: 3976747 (1976-08-01), Shale et al.
patent: 4014575 (1977-03-01), French et al.
patent: 4069132 (1978-01-01), Deering
Riesenfeld et al., Gas Purification, (Gulf 2nd ed.), 1974, pp. 298-302.
Cha Chang Y.
Ridley Richard D.
Novosad Stephen J.
Occidental Oil Shale Inc.
Suchfield George A.
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