Two-stage process for electrolytic graining of aluminum

Details Two-stage process for electrolytic graining of aluminum Two-stage process for electrolytic graining of aluminum

1991-07-22

1993-02-16

Niebling, John

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

20412975, 156665, 205214, C25F 304

Patent

active

051867958

ABSTRACT:
Aluminum, or an alloy thereof, is grained in a two-stage process wherein it is subjected to an electric current while immersed in an acidic electrolyte solution, such as a solution comprised of hydrochloric acid and aluminum chloride. Current density in the first stage of the process is at least as great and preferably substantially greater than in the second stage, while both treatment and time and current consumption in the first stage are less than in the second stage. The process provides a fine uniform grain that is essentially free of pits and is especially beneficial for use in the manufacture of aluminum supports for lithographic printing plates.

REFERENCES:
patent: 3755116 (1973-03-01), Terai et al.
patent: 4087341 (1978-11-01), Takahashi et al.
patent: 4213835 (1980-07-01), Fickelscher
patent: 4272342 (1981-06-01), Oda et al.
patent: 4297184 (1981-10-01), Dyer
patent: 4518471 (1985-05-01), Arora
patent: 4548683 (1985-04-01), Huang et al.
patent: 4666576 (1987-05-01), Pliefke
patent: 4721552 (1988-01-01), Huang et al.
patent: 4735696 (1988-04-01), Huang et al.
patent: 4786381 (1988-11-01), Mohr et al.
patent: 5041198 (1991-08-01), Hausmann

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