Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1978-08-24
1980-12-09
Lesmes, George F.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
427273, 428524, 430157, G02C 518
Patent
active
042385598
ABSTRACT:
A resist mark comprising two layers of resist, one of which is saturated with a diluant which does not dissolve the other. In one embodiment, the two layers of resist are applied upon a substrate, the first layer of which is more soluble in a developer. The second layer is said saturated resist and the first layer is non-saturated. This composite is preferably used to form a relief mask with recessed sidewalls used in lift-off processes.
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Feng Bai-Cwo
Feng George C.
Buffalow E. Rollins
Bunnell David M.
Galvin Thomas F.
International Business Machines - Corporation
Lesmes George F.
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