Two layer resist system

Details Two layer resist system Two layer resist system

1978-08-24

1980-05-20

Hoffman, James R.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 44, 427 431, 427 531, 427 541, B05D 302, B05D 306, B05D 136

Patent

active

042040094

ABSTRACT:
A resist mask comprising two layers of resist, one of which is saturated with a dilutant which does not dissolve the other. In one embodiment, the two layers of resist are applied upon a substrate, the first layer of which is more soluble in a developer. The second layer is said saturated resist and the first layer is non-saturated. This composite is preferably used to form a relief mask with recessed sidewalls used in lift-off processes.

REFERENCES:
patent: 3669661 (1972-06-01), Page et al.
patent: 3934057 (1976-01-01), Moreau et al.
patent: 4004044 (1977-01-01), Franco et al.
patent: 4024293 (1977-05-01), Hatzakis

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