Two-halogen donor mixture for XeF (C.fwdarw.A) laser

Details Two-halogen donor mixture for XeF (C.fwdarw.A) laser Two-halogen donor mixture for XeF (C.fwdarw.A) laser

1986-03-14

1987-04-21

Scott, Jr., Leon

Coherent light generators

Particular active media

Gas

372 57, H01S 322

Patent

active

046602100

ABSTRACT:
An improved electric discharge XeF excimer laser employs a reaction gas mixture containing NF.sub.3 and F.sub.2 in proportions that tailor the kinetics of the electrochemical reactions in order to achieve a substantial increase in power.

REFERENCES:
patent: 4348647 (1982-09-01), Nighan et al.
Bychkov et al., "Laser Utilizing an Ar--Xe--NF.sub.3 Mixture with a Discharge Stabilized by a Short-Pulse Electron Beam"; Sov. Jqe, vol. 9(5), May 79.
Hasson et al.; "Gain and Fluorescence Measurements in Photoionization-Stabilized XeF Discharge Lasers Operat. at High Energy Loadings", Appl. Phys. Lett., vol. 31, No. 3, Aug. 1977.
Tuxworth et al., "Operations of Discharge-Excited KrF and XeF Lasers at Elevated Temp."; J. Phys. D.-Appl. Phys. 13 p. 135, Feb. 1980.
Nighan et al., "Synthesis of Rare Gas-halide Mixtures Resulting in Efficient XeF (C.fwdarw.A) Laser Oscill." Appl. Phys. Lett. 45(9), Nov. 1984.
Nachshon et al., "Efficient XeF (C.fwdarw.A) Laser Oscill. Using Electron-Beam Excitation"; J. Appl. Phys. 56(1), Jul. 84.
Nighan et al., "Optimization of Electrically Excited XeF (C.fwdarw.A) Laser Performance", Appl. Phys. Lett., vol. 42, No. 12, p. 1006, Jun. 15, 83.

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