Cleaning and liquid contact with solids – Apparatus – With plural means for supplying or applying different fluids...
Reexamination Certificate
2005-03-09
2011-10-18
Perrin, Joseph L (Department: 1711)
Cleaning and liquid contact with solids
Apparatus
With plural means for supplying or applying different fluids...
C134S094100, C134S095100, C134S144000, C134S902000
Reexamination Certificate
active
08037891
ABSTRACT:
An object of the present is to uniform particle diameters and speeds of liquid droplets in a two-fluid nozzle for cleaning substrates which mixes gas and liquid internally and injects liquid droplets with gas so as to clean a substrate. The two-fluid nozzle for cleaning substrates has a gas supply passage for supplying gas, a liquid supply passage for supplying liquid, and a lead-out passage for leading out internally-formed liquid droplets, wherein an injection port for injecting liquid droplets to the outside is formed at the front end of the lead-out passage, and wherein a cross-sectional area Sb of the injection port is formed smaller than a cross-sectional area Sa of the lead-out passage, and a cross sectional area Sc of an exit of the gas supply passage is formed smaller than the cross-sectional area Sa of the lead-out passage.
REFERENCES:
patent: 3315611 (1967-04-01), Thompson
patent: 4511087 (1985-04-01), Matsumoto
patent: 5014790 (1991-05-01), Papavergos
patent: 5918817 (1999-07-01), Kanno et al.
patent: 6253963 (2001-07-01), Tachibana
patent: 2003/0079764 (2003-05-01), Hirose et al.
patent: 2003/0178047 (2003-09-01), Hirae
patent: 2004/0031503 (2004-02-01), Eitoku
patent: 2004/0206378 (2004-10-01), Okuda et al.
patent: 197 40 996 (1998-06-01), None
patent: 0 314 354 (1989-05-01), None
patent: 49-101916 (1974-09-01), None
patent: 59-179259 (1984-10-01), None
patent: 561516 (1991-10-01), None
patent: 5-63658 (1993-08-01), None
patent: 7-116561 (1995-05-01), None
patent: 10-156229 (1998-06-01), None
patent: 2001-252604 (2001-09-01), None
patent: 2003-197597 (2003-07-01), None
patent: 2003-203892 (2003-07-01), None
Machine Translation of JP 2001252604 to Tateyama et al., Sep. 2001.
Supplementary European Search Report for Application No. EP 05 72 0344.
Notification of Transmittal of Translation of the International Preliminary Report on Patentability (Form PCT/IB/338)—PCT/JP2005/004072, dated Jan. 2004.
PCT International Preliminary Report on Patentability (Form PCT/IB/373)—PCT/JP2005/004072, dated Jan. 2004.
Translation of PCT Written Opinion of the International Searching Authority—(Form PCT/ISA/237)—PCT/JP2005/004072, dated Jan. 2004.
Japanese Office Action issued on Jul. 7, 2009 for Japanese Patent Application No. 2005-064781 with English translation.
Hirota Yusaku
Kanno Itaru
Nagayasu Hiroshi
Sekiguchi Kenji
Shimose Shouichi
Osterhout Benjamin
Perrin Joseph L
Smith , Gambrell & Russell, LLP
Tokyo Electron Limited
LandOfFree
Two-fluid nozzle for cleaning substrate and substrate... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Two-fluid nozzle for cleaning substrate and substrate..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Two-fluid nozzle for cleaning substrate and substrate... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4259514