Two-dimensional structure for determining an overlay...

Optics: measuring and testing – By alignment in lateral direction – With registration indicia

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S022000, C430S030000, C257S797000, C438S401000

Reexamination Certificate

active

07099010

ABSTRACT:
A two-dimensional periodic pattern that is symmetrical with respect to a first and a second direction allows the determination of an overlay accuracy that is obtained during the fabrication of the two-dimensional structure. Due to the symmetry of the structure, the overlay accuracy in the first direction may be determined on the basis of substantially the same reference data as used for the determination of the overlay accuracy of the second direction so that establishing libraries is simplified. Moreover, depending on the capability of the metrology tool, the overlay accuracy in both directions may be obtained simultaneously.

REFERENCES:
patent: 3781014 (1973-12-01), Kolwicz
patent: 4259682 (1981-03-01), Gamo
patent: 4475811 (1984-10-01), Brunner
patent: 5216257 (1993-06-01), Brueck et al.
patent: 5622796 (1997-04-01), Canestrari et al.
patent: 5635336 (1997-06-01), Bae
patent: 5677091 (1997-10-01), Barr et al.
patent: 5715063 (1998-02-01), Ota
patent: 5867276 (1999-02-01), McNeil et al.
patent: 5877860 (1999-03-01), Borden
patent: 5880838 (1999-03-01), Marx et al.
patent: 6051348 (2000-04-01), Marinaro et al.
patent: 6081334 (2000-06-01), Grimbergen et al.
patent: 6130750 (2000-10-01), Ausschnitt et al.
patent: 6245584 (2001-06-01), Marinaro et al.
patent: 6396569 (2002-05-01), Zheng et al.
patent: 6433878 (2002-08-01), Niu et al.
patent: 6573986 (2003-06-01), Smith et al.
patent: 6855464 (2005-02-01), Niu et al.
patent: 2002/0135781 (2002-09-01), Singh et al.
patent: 2002/0158193 (2002-10-01), Sezginer et al.
patent: 2003/0026471 (2003-02-01), Adel et al.
patent: 28 19 400 (1978-05-01), None
patent: 197 36 959 (1997-08-01), None
patent: 199 25 831 (2000-12-01), None
patent: 0 498 006 (1992-08-01), None
patent: 57166034 (1982-10-01), None
patent: 59004019 (1984-01-01), None
patent: 08321532 (1996-12-01), None
patent: 09033213 (1997-02-01), None
patent: 11191530 (1999-07-01), None
Stein and Whitefield, “Integral Measurement of Micron Lines on Wafers, Masks and Layers by Using Diffraction,”IBM Technical Disclosure Bulletin,vol. 24, No. 7A, pp. 3178-3180, Dec. 1981.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Two-dimensional structure for determining an overlay... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Two-dimensional structure for determining an overlay..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Two-dimensional structure for determining an overlay... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3707050

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.