Measuring and testing – Surface and cutting edge testing – Roughness
Patent
1992-09-22
1994-09-20
Raevis, Robert
Measuring and testing
Surface and cutting edge testing
Roughness
G01B 528
Patent
active
053478541
ABSTRACT:
Two dimensional profiling of samples, such as integrated circuits containing trenches or lines, is accomplished using contact force atomic force microscopy by controlling the tip position responsive to the real-time measured local slope of the surface in contact with the tip.
REFERENCES:
patent: 2620655 (1952-12-01), Priest
patent: 2943719 (1990-07-01), Akamine et al.
patent: 3888012 (1975-06-01), Droz
patent: 4724318 (1988-02-01), Binnig
patent: 4780961 (1988-11-01), Shelton et al.
patent: 4888550 (1989-12-01), Reid
patent: 4935634 (1990-06-01), Hansma et al.
patent: 5003815 (1991-04-01), Martin et al.
patent: 5017010 (1991-05-01), Mamin et al.
patent: 5025658 (1991-06-01), Elings et al.
patent: 5060216 (1991-10-01), Suzuki et al.
patent: 5166516 (1992-11-01), Kajimura
patent: 5198715 (1993-03-01), Elings et al.
"Surface Profilometer With Ultra-High Resolution", IBM Technical Disclosure Bulletin, V. 34, No. 4A, Sep. 1991, pp. 1-2.
L. C. Kong et al, "A Micromachined Silicon Scan Tip For An Atomic Force Microscope", IEEE, 1990, pp. 28-31.
G. Meyer et al, "Simultaneous measurement of lateral and normal forces with an optical-beam-deflection atomic force microscope", Appl. Phys. Lett., vol. 57, No. 20, 1990, pp. 2089-2091.
M. Rodgers, et al, "Using the Atomic Force Microscope to measure submicron dimensions of integrated circuit devices and processes", SPIE vol. 1464, 1991, pp. 358-366.
Martin Yves
Wickramasinghe Hemantha K.
Feig Philip J.
International Business Machines - Corporation
Kaufman Stephen C.
Raevis Robert
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