Two-dimensional position/orientation measuring mark, two-dimensi

Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Earth science

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

702150, 901 47, B01B 1100

Patent

active

059012730

ABSTRACT:
A mark is provided on an object surface of an object under measurement, and the mark provides two intersection points P.sub.1 and P.sub.2 between first and second straight lines L.sub.1, L.sub.2, and between second and third lines L.sub.2, L.sub.3, in which an angle ".alpha." defined by the first and second straight lines L.sub.1 and L.sub.2, another angle ".beta." defined by the second and third straight lines L.sub.2 and L.sub.3, and a distance between P.sub.1 and P.sub.2 are known. This mark is imaged on at least one set of one-dimensional optical sensor. When a sensor signal having a light intensity distribution along a longitudinal direction is outputted from the one-directional optical sensor, a calculation unit calculates positions of the straight lines L.sub.1 to L.sub.3 of the mark image on the one-dimensional optical sensor in response to the sensor signal. Based upon this calculation result, another calculation is made of at least one position of the two intersection points P.sub.1 and P.sub.2, and also an inclination of at least one straight line among the straight lines L.sub.1 to L.sub.3. For instance, this calculation result is used as a reference point for measuring the position of the object under measurement, and also a reference line for measuring the orientation thereof.

REFERENCES:
patent: 4488173 (1984-12-01), Di Matteo et al.
patent: 4630225 (1986-12-01), Hisano
patent: 4662752 (1987-05-01), Tucker et al.
patent: 4672564 (1987-06-01), Egli et al.
patent: 4791482 (1988-12-01), Barry et al.
patent: 4843287 (1989-06-01), Toft
patent: 4933864 (1990-06-01), Evan, Jr. et al.
patent: 5076690 (1991-12-01), deVos
patent: 5274575 (1993-12-01), Abe
patent: 5621807 (1997-04-01), Eibert et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Two-dimensional position/orientation measuring mark, two-dimensi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Two-dimensional position/orientation measuring mark, two-dimensi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Two-dimensional position/orientation measuring mark, two-dimensi will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1876309

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.