Two-dimensional patterning method, electronic device using...

Details Two-dimensional patterning method, electronic device using... Two-dimensional patterning method, electronic device using...

2004-07-27

2009-02-24

Berman, Jack I (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492210, C250S492220, C250S492300, C250S492100

Reexamination Certificate

active

07495238

ABSTRACT:
A novel two-dimensional patterning method enabling two-dimension patterning without using any photosensitive material and ion milling, wherein a two-dimensional pattern is formed by destroying a blister provided on a substrate by electron or ion irradiation.

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patent: 6407399 (2002-06-01), Livesay
patent: 7038290 (2006-05-01), Li

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