Two-dimensional measurement system

Details Two-dimensional measurement system Two-dimensional measurement system

2011-03-15

2011-03-15

Tieu, Benny Q (Department: 2625)

Image analysis

Image transformation or preprocessing

Measuring image properties

C382S286000, C382S274000, C358S504000, C358S525000, C358S406000

Reexamination Certificate

active

07907795

ABSTRACT:
A system (100) and a method (500) are described for determining a two-dimensional position of a location in an image. The method (500) starts by imaging (510) a two-dimensional pattern (440). The two-dimensional pattern comprises a plurality of at least partially overlapping two-dimensional sub-patterns (410, 420, 430). The sub-patterns (410, 420, 430) repeat with different spatial periods to form the two-dimensional pattern, and the spatial period of the sub-patterns are anharmonic. A two-dimensional offset for each of the sub-patterns is then determined (540) at the location in the image formed by the imaging. The two-dimensional position is determined from said two-dimensional offsets.

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