Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1984-02-28
1986-05-20
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430146, 430157, 430171, 430176, 430186, G03C 154, G03C 178
Patent
active
045901430
ABSTRACT:
Disclosed is a two-component diazotype material comprising a support and a light-sensitive layer containing (a) at least one diazonium compound derived from p-phenylenediamine and carrying a basic heterocyclic radical in the 4-position and ether groups in the 2- and 5-positions, (b) a coupler component, and (c) an acid stabilizer, the diazonium compound being present in the form of a benzenesulfonate or toluenesulfonate. The disclosed materials have a good storability and are easily developed.
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patent: 3039872 (1962-06-01), de Boer et al.
patent: 3153592 (1964-10-01), Klimkowski et al.
patent: 3219447 (1965-11-01), Neugebauer et al.
patent: 3522048 (1970-07-01), Welch
patent: 3719491 (1973-03-01), Mizianty
Dinaburg, M. S., "Photosensitive Diazo Cpds", The Focal Press, 1964, pp. 92, 93 and 115.
Bowers Jr. Charles L.
Hoechst Aktiengesellschaft
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