Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1980-02-25
1981-06-16
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430148, 430150, 430180, 430187, G03C 158, G03C 154
Patent
active
042738504
ABSTRACT:
This invention relates to an improvement in a two-component diazotype material, composed of a support and of a light-sensitive layer applied to the support, the layer containing at least one benzene diazonium salt as the light-sensitive component and at least one coupler, the improvement comprising the combination of at least one 2,5-dialkoxy-4-mercaptobenzene diazonium salt and at least one compound of the general formula ##STR1## in which R.sub.1 and R.sub.2 are identical or different and denote hydrogen or alkyl, alkenyl, aralkyl, aryl or cycloalkyl groups, which can be further substituted.
REFERENCES:
patent: 2286701 (1942-06-01), Werner
patent: 2537098 (1951-01-01), Slifkin et al.
patent: 2970909 (1951-02-01), Slimowicz
patent: 3272627 (1966-09-01), Sus et al.
patent: 3406071 (1968-10-01), Sus et al.
patent: 3645741 (1972-02-01), Shiraishi et al.
patent: 3664840 (1972-05-01), Saito et al.
patent: 3761263 (1973-09-01), Fleming et al.
Landau, R., "Fascicules 9217,", Dist. by Andrews Paper & Chem. Co., 1962, pp. 3 and 49.
Bowers Jr. Charles L.
Bryan James E.
Hoechst Aktiengesellschaft
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