Two-compartment chamber for sequential processing

Details Two-compartment chamber for sequential processing Two-compartment chamber for sequential processing

2005-02-22

2005-02-22

Hassanzadeh, Parviz (Department: 1763)

Coating apparatus

Gas or vapor deposition

Multizone chamber

C118S7230AN, C118S733000, C414S217000, C414S939000, C156S345310, C204S298250, C204S298260, C204S298270, C204S298280, C204S298350

Reexamination Certificate

active

06858085

ABSTRACT:
An apparatus for sequential and isolated processing of a workpiece comprises a two compartment chamber and a mechanism to transfer the workpiece from one compartment to the other compartment. The transfer mechanism comprises two doors that seal the pathway between the two compartments between movement so that the two compartments are isolated and the workpiece can be processed sequentially and isolatedly in each compartment. The apparatus further comprises components to enable the processing of a workpiece: a delivery system to delivery precursor, a plasma source to generate a plasma and a vacuum pump to maintain a sub-atmospheric pressure. The preferred method of processing a workpiece is to deposit or adsorb a thin layer in the first compartment and then to transfer the workpiece to the second compartment for a reaction or a plasma reaction on the existing thin layer.

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