Twisted-compensated low-energy electron microscope

Details Twisted-compensated low-energy electron microscope Twisted-compensated low-energy electron microscope

2005-09-13

2005-09-13

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492300, C250S3960ML, C250S3960ML, C250S397000, C250S398000

Reexamination Certificate

active

06943360

ABSTRACT:
One embodiment disclosed relates to a LEEM-type apparatus for inspecting a substrate. An illumination system generates an incident beam, and an objective lens system focuses the incident beam onto the substrate. In this case, the objective lens system comprises a magnetic immersion lens causing circumferential velocities in the incident beam, and the illumination system includes another magnetic immersion lens causing circumferential velocities in the incident beam that compensate for the circumferential velocities caused by the magnetic immersion lens in the objective lens system. Advantageously, this enables improved performance of parallel imaging e-beam systems that use a magnetic immersion objective lens.

REFERENCES:
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patent: 5663568 (1997-09-01), Waskiewicz
patent: 6610980 (2003-08-01), Veneklasen et al.
R.M TROMP “ Low-energy electron microscopy”, IBM J. RES. Develop., Jul. 2000, pp. 503-516, vol. 44, No. 4.
V. Kolarik, et al. “Close packed prism arrays for electron microscopy”, Optik 87, No. 1 (1991), pp. 1-12.
H. Rose, et al. “Outline of a versatile corrected LEEM”, Optik 92, No. 1 (1992), pp. 31-44.

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