Turning tool for grooving polishing pad, apparatus and...

Metal working – Method of mechanical manufacture – Shaping one-piece blank by removing material

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C407S067000, C407S069000, C407S070000, C407S117000, C407S113000, C082S001110

Reexamination Certificate

active

07140088

ABSTRACT:
Disclosed is a turning tool for cutting circumferential grooves into a surface of a polishing pad formed of a resin material and utilized for polishing semiconductor devices. The turning tool comprising a cutting part arranged to have a tooth width within a range of 0.005–1.0 mm, a wedge angle within a range of 15–35 degrees, and a front clearance angle within a range of 65–45 degrees. A polishing pad effectively formed by using the turning tool, and an apparatus and a method of producing such a polishing pad by utilizing the turning tool are also disclosed.

REFERENCES:
patent: 798856 (1905-09-01), Wetter
patent: 1410451 (1922-03-01), Bullard et al.
patent: 1416843 (1922-05-01), Labonte
patent: 2701192 (1955-02-01), Maass
patent: RE25955 (1966-02-01), Emmons
patent: 3466721 (1969-09-01), Binns
patent: 4063841 (1977-12-01), Niman, Jr.
patent: 4474721 (1984-10-01), Carpenter
patent: 5031491 (1991-07-01), Hofmann
patent: 5067377 (1991-11-01), Dona et al.
patent: 5205678 (1993-04-01), Britsch et al.
patent: 5329735 (1994-07-01), Charlton et al.
patent: 5370023 (1994-12-01), Morgan et al.
patent: 5398458 (1995-03-01), Henriksen et al.
patent: 5578362 (1996-11-01), Reinhardt et al.
patent: 5921855 (1999-07-01), Osterheld et al.
patent: 5984769 (1999-11-01), Bennett et al.
patent: 6206759 (2001-03-01), Agarwal et al.
patent: 6227771 (2001-05-01), Lagerberg et al.
patent: 6238271 (2001-05-01), Cesna
patent: 6241585 (2001-06-01), White
patent: 6340325 (2002-01-01), Chen et al.
patent: 6406363 (2002-06-01), Xu et al.
patent: 6439989 (2002-08-01), Reinhardt et al.
patent: 6464563 (2002-10-01), Lensing
patent: 6488575 (2002-12-01), Agarwal et al.
patent: 6520847 (2003-02-01), Osterheld et al.
patent: 6544104 (2003-04-01), Koike et al.
patent: 6561891 (2003-05-01), Eppert et al.
patent: 6572445 (2003-06-01), Laursen
patent: 6602436 (2003-08-01), Mandigo et al.
patent: 6632129 (2003-10-01), Goetz
patent: 6641471 (2003-11-01), Pinheiro et al.
patent: 6656019 (2003-12-01), Chen et al.
patent: 6656030 (2003-12-01), Xu et al.
patent: 6685548 (2004-02-01), Chen et al.
patent: 6688957 (2004-02-01), Tolles
patent: 6736714 (2004-05-01), Dudovicz
patent: 6749485 (2004-06-01), James et al.
patent: 6749714 (2004-06-01), Ishikawa et al.
patent: 6758735 (2004-07-01), Blalock
patent: 6783436 (2004-08-01), Muldowney
patent: 6852020 (2005-02-01), Petroski et al.
patent: 6869343 (2005-03-01), Suzuki
patent: 6893325 (2005-05-01), Robinson
patent: 7017246 (2006-03-01), Suzuki
patent: 2003/0003857 (2003-01-01), Shimagaki et al.
patent: 2004/0014413 (2004-01-01), Kawahashi et al.
patent: 47-16044 (1972-06-01), None
patent: 63-22002 (1988-06-01), None
patent: 11-70463 (1999-03-01), None
patent: 2000-94303 (2000-04-01), None
patent: 2001-018164 (2001-01-01), None
patent: 2002-011630 (2002-01-01), None
The Science of CMP; Aug. 20, 1997; pp. 113-119; Chapter 4, Part III “Structure and Feature of the polishing pad”. (Partial Translation).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Turning tool for grooving polishing pad, apparatus and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Turning tool for grooving polishing pad, apparatus and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Turning tool for grooving polishing pad, apparatus and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3666649

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.