Tunneling-effect thin film transistor, method of...

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material

Reexamination Certificate

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Details

C257S365000, C257SE29275, C438S157000, C438S158000

Reexamination Certificate

active

07488978

ABSTRACT:
A thin film transistor, a method for manufacturing the thin film transistor, and an organic electroluminescence display using the thin film transistor are disclosed. The thin film transistor includes a gate electrode, a semiconductor layer that overlaps the gate electrode, a first insulating layer disposed between the semiconductor layer and the gate electrode, and first and second electrodes that use the semiconductor layer as a channel, and are disposed at different layers. The thin film transistor further includes a second insulating layer disposed between the semiconductor layer and one of the first and second electrodes, and a first doping semiconductor layer disposed between the semiconductor layer and the other of the first and second electrodes.

REFERENCES:
patent: 5428238 (1995-06-01), Hayashi et al.
patent: 5470768 (1995-11-01), Yanai et al.
patent: 5539219 (1996-07-01), den Boer et al.
patent: 5605845 (1997-02-01), Young
patent: 5994173 (1999-11-01), Oki et al.
patent: 2004/0031991 (2004-02-01), Jang

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