Semiconductor device manufacturing: process – Having magnetic or ferroelectric component
Patent
1998-04-08
2000-08-29
Bowers, Charles
Semiconductor device manufacturing: process
Having magnetic or ferroelectric component
257421, 360113, 365158, H01L 2100, G11B 539
Patent
active
061107514
ABSTRACT:
A tunnel junction structure is provided. A first magnetic layer is formed on a support substrate. A tunnel insulating layer is disposed on the first magnetic layer, the tunnel insulating layer containing a metal element as a constituent. A second magnetic layer is disposed on the tunnel insulating layer. A diffusion preventing layer disposed between the first magnetic layer and the tunnel insulating layer. The diffusion preventing layer suppresses mutual diffusion between metal atoms in the first magnetic layer and metal atoms in the tunnel insulating layer. The tunnel insulating layer and the diffusion preventing layer each have a thickness allowing tunnel current to flow between the first and second magnetic layers.
REFERENCES:
patent: 5862022 (1999-01-01), Noguchi et al.
patent: 5986858 (1999-11-01), Sato et al.
Kikuchi Hideyuki
Kobayashi Kazuo
Sato Masashige
Bowers Charles
Fujitsu Limited
Thompson Craig
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