Tunnel field effect transistor

Miscellaneous active electrical nonlinear devices – circuits – and – Specific identifiable device – circuit – or system – Integrated structure

Reexamination Certificate

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Reexamination Certificate

active

07839209

ABSTRACT:
A tunnel transistor includes source diffusion (4) of opposite conductivity type to a drain diffusion (6) so that a depletion layer is formed between source and drain diffusions in a lower doped region (8). An insulated gate (16) controls the position and thickness of the depletion layer. The device includes a quantum well formed in accumulation layer (20) which is made of a different material to the lower layer (2) and cap layer (22).

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patent: 4835581 (1989-05-01), Kuroda et al.
patent: 5105241 (1992-04-01), Ando
patent: 5840596 (1998-11-01), Kovacic
patent: 2002/0017644 (2002-02-01), Fitzgerald
patent: 2004/0206950 (2004-10-01), Suvkhanov et al.
patent: 0256360 (1988-02-01), None
patent: 1253648 (2002-10-01), None
patent: 2006030505 (2006-03-01), None
“Silicon Surface Tunnel Transistor”; Applied Physics Letters, AIP, American Institute of Physics, Melville, NY, US; vol. 67, No. 4; Jul. 24, 1995; pp. 494-496; XP012014432; ISSN: 0003-6951.
Leburton, J.P., et al; “Bipolar Tunneling Field-Effect Transistor: A Three-Terminal Negative Differential Resistance Device for High-Speed Applications”; Applied Physics Letters; AIP; American Institute of Physics, Melville, NY, US; vol. 52, No. 19; May 9, 1988; pp. 1608-1610; XP000035703; ISSN: 0003-6951.

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