Tuning electrodes used in a reactor for electrochemically...

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

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C700S037000, C700S044000, C700S045000, C700S121000, C700S262000, C700S263000, C700S119000, C427S008000, C427S009000, C427S585000, C205S082000, C205S083000, C205S084000

Reexamination Certificate

active

07020537

ABSTRACT:
A facility for selecting and refining electrical parameters for processing a microelectronic workpiece in a processing chamber is described. The facility initially configures the electrical parameters in accordance with either a numerical of the processing chamber or experimental data derived from operating the actual processing chamber. After a workpiece is processed with the initial parameter configuration, the results are measured and a sensitivity matrix based upon the numerical model of the processing chamber is used to select new parameters that correct for any deficiencies measured in the processing of the first workpiece. These parameters are then used in processing a second workpiece, which may be similarly measured, and the results used to further refine the parameters.

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