Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2008-07-01
2008-07-01
Chen, Kin-Chan (Department: 1792)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S700000, C438S455000, C359S223100, C359S230000
Reexamination Certificate
active
07393793
ABSTRACT:
A method of manufacturing a tunable wavelength optical filter. The method includes steps of forming a first sacrificial oxide film for floating a lower mirror on a semiconductor substrate; sequentially laminating conductive silicon films and oxide films for defining a mirror region on the first sacrificial oxide film in a multi-layer and laminating another conductive silicon film to form a lower mirror; sequentially laminating conductive silicon films and oxide films for defining the mirror region on a second sacrificial oxide film in a multi-layer and laminating another conductive silicon film to form an upper mirror and forming an optical tuning space between the lower mirror and the upper mirror and etching the first sacrificial oxide film and the second sacrificial oxide film such that the lower mirror is floated on the semiconductor substrate.
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Choi Chang Auck
Jun Chi Hoon
Kim Chang Kyu
Kim Youn Tae
Lee Myung Lae
Blakely , Sokoloff, Taylor & Zafman LLP
Chen Kin-Chan
Electronics and Telecommunications Research Institute
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