X-ray or gamma ray systems or devices – Source
Patent
1992-07-16
1993-09-21
Porta, David P.
X-ray or gamma ray systems or devices
Source
372 5, 372 22, H01S 3098
Patent
active
052475620
ABSTRACT:
In a first preferred embodiment, the invention is an apparatus for generating radiation comprising: means for generating a beam of electrons; means for constraining the beam of electrons to travel in a substantially straight path over a predetermined distance; means for generating a standing wave of light; and means for causing the beam of electrons to pass through the standing wave of light during a portion of the straight path, thereby causing certain of said electrons to emit radiation. The standing wave of light is preferably generated by a continuous wave beam of light that is circulating in a power build up cavity. In another preferred embodiment, the invention is a method of generating radiation, the method comprising the steps of
REFERENCES:
patent: 4598415 (1986-08-01), Luccio
patent: 4646308 (1987-02-01), Kafka et al.
patent: 4817124 (1989-03-01), Kelterson et al.
patent: 4975917 (1990-12-01), Villa
patent: 5027361 (1991-06-01), Kozlousky et al.
T. Shintake, K. Huke, J. Tanaka, I. Sato and I. Kumabe, "Development of Microwave Undulator," Japan J. Appl. Phys., vol. 22, No. 5, pp. 844-851 (May 1983).
P. Dobiasch, P. Meystre and M. O. Scully, "Optical Wiggler Free-Electron X-Ray Laser in the 5 .ANG. Region," IEEE J. Quant. Electr. V. QE-19, No. 12, pp. 1812-1820 (Dec. 1983).
J. Gea-Banacloche, G. T. Moore, R. R. Schlicher, M. O. Scully and H. Walther, "Soft X-Ray Free-Electron Laser With a Laser Undulator," IEEE J. Quant. Electr. vol. QE-23, No. 9, pp. 1558-1570 (Sep. 1987).
R. H. Pantell, J. Feinstein and A. H. Ho, "Interferometer Mirrors with Holes On-Axis," Nucl. Instr. Meth. Phys. Res. A 296, pp. 638-641 (1990).
M. Keselbrener, S. Ruschin, B. Lissak and A. Gover, "Numerical Studies of Resonators with On-Axis Holes in Mirrors for FEL Application," Nucl. Instr. Meth. Phys. Res. A304, pp. 782-785 (1991).
R. H. Milburn, "Electron Scattering by an Intense Polarized Photon Field," Phys. Rev. Letters, vol. 10, No. 3, pp. 75-77 (1963).
F. R. Arutyunian and V. A. Tumanian, "The Compton Effect on Relativistic Electrons and the Possibility of Obtaining High Energy Beams," Physics Letters, vol. 4, No. 3, pp. 176-178 (1963).
R. H. Pantell, G. Soncini, and H. E. Puthoff, "S-9-Stimulated Photon-Electron Scattering," IEEE Journal of Quantum Electronics, vol. QE-4, No. 11, pp. 905-907 (1968).
A. Gover, C. M. Tang and P. Sprangle, "Feasibility of dc to visible high-power conversion employing a stimulated Compton free electron laser with a waveguided CO.sub.2 laser pump wave and an axial electric field," J. App. Phys., vol. 53, No. 1, pp. 124-129 (1982).
J. Gea Benacloche, G. T. Moore and M. O. Scully, "Prospects for an x-ray Free-Electron Laser," Free-Electron Generators of Coherent Radiation, ed. C. A. Brau, S. F. Jacobs and M. O. Scully, SPIE vol. 453, Bellingham, WA, pp. 393-401 (1983).
T. Taguchi and K. Mima, "Numerical Studies of Induced Emission and Saturation of Free Electron Lasers Using a CO.sub.2 Laser Wiggler," Japanese Journal of Applied Physics, vol. 28, No. 12, pp. L2222-L2224 (1989).
P. Sprangle, B. Hafizi, and F. Mako, "New x-ray source for lithography," Appl. Phys. Lett., vol. 55, No. 24, pp. 2559-2560 (1989).
L. R. Elias, "High Power, cw, Efficient, Tunable (uv through ir) Free-Electron Laser Using Low-Energy Electron Beams," Phys. Rev. Lett., vol. 42, No. 15, pp. 977-981 (1979).
Porta David P.
The Massachusetts Institute of Technology
Weissburg Steven J.
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