Tunable plasma frequency devices

Details Tunable plasma frequency devices Tunable plasma frequency devices

2007-08-20

2008-11-18

Mancuso, Huedung (Department: 2821)

Communications: radio wave antennas

Antennas

Having electric space discharge device

Reexamination Certificate

active

07453403

ABSTRACT:
A reduced noise and selectively configurable plasma device is capable of interpreting electromagnetic signals having an operating frequency and has a plasma mechanism with a plasma that is ionizable to a plasma frequency. An ionizing mechanism for ionizing the plasma and a control that is operative to control the ionizing mechanism, ionize the plasma to the plasma frequency by application of plasma ionizing energy pulses. An interpreting mechanism operates to interpret the electromagnetic signals only in a period between ionization of the plasma with the energy pulses.

REFERENCES:
patent: 5963169 (1999-10-01), Anderson et al.
patent: 6710746 (2004-03-01), Anderson et al.
patent: 6967622 (2005-11-01), Ishii et al.
patent: 7068226 (2006-06-01), Mitra
patent: 7145512 (2006-12-01), Metz
patent: 7274333 (2007-09-01), Alexeff
patent: 2005/0192727 (2005-09-01), Shostak et al.

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