Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
Reexamination Certificate
2009-04-14
2010-11-23
Blum, David S (Department: 2813)
Semiconductor device manufacturing: process
Including control responsive to sensed condition
Optical characteristic sensed
C438S016000, C438S401000, C356S399000, C257SE21530, C257SE21211, C257SE33066
Reexamination Certificate
active
07838310
ABSTRACT:
An alignment target with geometry designs provides a desired alignment offset for processes (both symmetric and asymmetric) on a wafer substrate. The alignment target includes one or more sub-targets, where each sub-target is defined as having a left portion and a right portion having a different geometric pattern, and where the left portion has a geometry density and the right portion has a geometry density.
REFERENCES:
patent: 5966215 (1999-10-01), Markoya et al.
patent: 6465322 (2002-10-01), Ziger et al.
patent: 6486954 (2002-11-01), Mieher et al.
patent: 6493065 (2002-12-01), Ina et al.
patent: 6639677 (2003-10-01), Ina et al.
patent: 6654107 (2003-11-01), Watanabe et al.
patent: 6841890 (2005-01-01), Fujimoto
patent: 7112890 (2006-09-01), Markoya
patent: 2001/0051441 (2001-12-01), Ziger et al.
patent: 2003/0227625 (2003-12-01), Heisley et al.
patent: 2004/0066517 (2004-04-01), Huang et al.
patent: 2004/0099963 (2004-05-01), Holloway et al.
patent: 2005/0096779 (2005-05-01), Markoya
patent: 3-005753 (1991-01-01), None
patent: 4-186717 (1992-07-01), None
patent: 7-066113 (1995-03-01), None
patent: 7-226365 (1995-08-01), None
patent: 9-022861 (1997-01-01), None
patent: 11-083406 (1999-03-01), None
patent: 11-102061 (1999-04-01), None
patent: 2001-74606 (2001-03-01), None
patent: 2003-303763 (2003-10-01), None
Decision of Rejection and Dismissal of Amendment for Japanese Patent Application No. 2004-318447, mailed May 27, 2008, 4 pgs.
Final Rejection and Translation of Final Rejection for Japanese Patent Application No. 2004-318447, mailed Jan. 31, 2008, 5 pgs.
Translation of Office Action for Japanese Patent Application No. 2004-318447 drafted on Oct. 10, 2007, 5 pages.
Non-Final Rejection mailed Nov. 15, 2007, for U.S. Appl. No. 11/516,748, filed Sep. 7, 2006, 6 pgs.
Final Rejection mailed Mar. 18, 2008, for U.S. Appl. No. 11/516,748, filed Sep. 7, 2006, 7 pgs.
Second Non-Final Rejection mailed Aug. 7, 2008, for U.S. Appl. No. 11/516,748, filed Sep. 7, 2006, 7 pgs.
Notice of Allowance mailed Jan. 9, 2009, for U.S. Appl. No. 11/516,748, filed Sep. 7, 2006, 6 pgs.
Notice of Allowance mailed Jun. 12, 2006, for U.S. Appl. No. 10/696,355, filed Oct. 30, 2003, 6 pgs.
Notice of Reasons for Rejection mailed Apr. 19, 2010 for Japanese Patent Application No. 2004-318447, 10 pgs.
ASML Holding N.V.
Blum David S
Sterne Kessler Goldstein & Fox P.L.L.C.
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