Electric lamp and discharge devices – With support and/or spacing structure for electrode and/or... – For plural electrodes of discharge device
Patent
1979-05-09
1980-09-16
Chatmon, Jr., Saxfield
Electric lamp and discharge devices
With support and/or spacing structure for electrode and/or...
For plural electrodes of discharge device
313174, 313176, 313250, 313302, 313348, H01J 188, H01J 1942
Patent
active
042232430
ABSTRACT:
The variety of technologies that have been applied in the development of a onded grid cathode are described. These include chemical vapor deposition of tungsten, molybdenum, iridium BN, and Si.sub.3 N.sub.4 on both sides of a sintered tungsten cathode disk. Zirconium and titanium getters have been used to eliminate nitrogen evolution problems. The getter plates are also used as heat shields for the bonded heater. Films of Si.sub.3 N.sub.4 have been added to the insulation to prevent calcium and barium diffusion into the layer and maintain adequate resistivity and breakdown strength. Plasma etching was introduced as a method of removing Si.sub.3 N.sub.4 from the cathode pores.
A new method, erosion lithography, is used for making the fine-detail grid structure, combining air erosion and lithographic techniques.
REFERENCES:
patent: 3154711 (1964-10-01), Beggs
patent: 3573535 (1971-04-01), Hughes
patent: 3638062 (1972-01-01), Beggs
patent: 3694260 (1972-09-01), Beggs
patent: 3843902 (1974-10-01), Miram et al.
patent: 3967150 (1976-06-01), Lien et al.
Lavoo Norman T.
Oliver David W.
Chatmon, Jr. Saxfield
Edelberg Nathan
Franz Bernard
Murray Jeremiah G.
The United States of America as represented by the Secretary of
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