Tube and injector for preheating gases in a chemical vapor depos

Details Tube and injector for preheating gases in a chemical vapor depos Tube and injector for preheating gases in a chemical vapor depos

1990-06-11

1992-09-15

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118725, 156345, C23C 1600

Patent

active

051468697

ABSTRACT:
A gas injector apparatus and process, having a gas injector tube ending at the top of a vertical reaction chamber, improves the thickness and resistivity uniformity of films deposited in CVD process reactors. The injection tube has a plurality of baffles to increase the residence time of reactant gases flowing toward the reaction chamber.

REFERENCES:
patent: 4232063 (1990-11-01), Rosler et al.
patent: 4579080 (1986-04-01), Martin et al.
patent: 4632058 (1986-12-01), Dixon et al.
patent: 4957781 (1990-09-01), Kanegae
Silicon Valley Group Brochure "SVG Vertical Thermal Reactor".

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