Troika acid semiconductor cleaning compositions and methods...

Details Troika acid semiconductor cleaning compositions and methods... Troika acid semiconductor cleaning compositions and methods...

2011-05-24

2011-05-24

Carrillo, Sharidan (Department: 1711)

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

C134S002000, C134S025400, C134S026000, C134S028000, C134S030000, C134S034000, C134S035000, C134S036000, C134S041000, C134S042000, C510S175000, C510S436000, C510S467000, C510S469000, C510S499000

Reexamination Certificate

active

07947130

ABSTRACT:
Semiconductor processing compositions for use with silicon wafers having an insulating layers and metallization layers on the wafers comprising water and one or more Troika acids which is also referred to as α,α-disubstituted trifunctional oximes or α-(Hydroxyimino) Phosphonoacetic acids, their salts, and their derivatives.

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