Troide plasma reactor with magnetic enhancement

Details Troide plasma reactor with magnetic enhancement Troide plasma reactor with magnetic enhancement

1984-12-26

1986-02-25

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118 501, 118620, 118728, 156643, 156646, 204298, H01L 21306, B44C 122, C03C 1500, C23F 102

Patent

active

045727597

ABSTRACT:
A triode apparatus with magnetic enhancement for dry processing semiconductor wafers and the like. A conductive substantially cylindrical chamber contains a cathode that is connected to a first source of AC power. A wafer stage mounted on the inside of the chamber wall is connected to a second source of AC power. The chamber has means for connection to a reference voltage potential. Means for generating a magnetic field perpendicular to the electric field generated between the chamber walls and the cathode is also provided.

REFERENCES:
patent: 4431473 (1984-02-01), Okano et al.
patent: 4483737 (1984-11-01), Mantei
patent: 4521286 (1985-06-01), Horwitz

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