Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1989-09-19
1993-06-01
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430191, 430192, 430193, 430272, 430277, 430278, G03F 7023, G03F 709, G03C 161
Patent
active
052158560
ABSTRACT:
A radiation-sensitive composition comprising an admixture in a solvent of: at least one alkali-soluble binder resin, at least one photoactive compound and an effective sensitivity enhancing amount of at least one tris (hydroxyphenyl) lower alkane compound; the amount of said binder resin being about 60% to 95% by weight, the amount of said photoactive component being about 5% to about 40% by weight, based on the total solids content of said radiation-sensitive composition.
REFERENCES:
patent: 3188210 (1965-06-01), Fritz et al.
patent: 3579542 (1971-05-01), Meyer et al.
patent: 4394496 (1983-07-01), Schrader
patent: 4738915 (1988-04-01), Komine et al.
patent: 4863828 (1989-09-01), Kawaba et al.
patent: 4871645 (1989-10-01), Uenishi et al.
Celanese Preliminary Information Bulletin--Tris(P-Hydroxyphenyl)Ethane (THPE).
Bowers Jr. Charles L.
OCG Microelectronic Materials Inc.
Simons William A.
Young Christopher G.
LandOfFree
Tris-(hydroxyphenyl) lower alkane compounds as sensitivity enhan does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Tris-(hydroxyphenyl) lower alkane compounds as sensitivity enhan, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Tris-(hydroxyphenyl) lower alkane compounds as sensitivity enhan will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1813616