Triple-probe plasma measuring apparatus for correcting space pot

Details Triple-probe plasma measuring apparatus for correcting space pot Triple-probe plasma measuring apparatus for correcting space pot

1992-10-27

1995-09-05

Strecker, Gerard R.

Electricity: measuring and testing

Using ionization effects

For analysis of gas, vapor, or particles of matter

324 711, 324 72, 324444, 324459, 324715, 324720, 374142, G01N 2762, G01R 2900, G01K 1300

Patent

active

054481732

ABSTRACT:
With a view to enabling errors in the space potential to be automatically corrected by detecting a floating potential in each of a plurality of probes and to remove the errors in measurement based on the corrected space potential to thereby realize the accurate measurement of the space potential, there is provided a triple-probe plasma measuring apparatus, which comprises: a circuit for measuring electron temperature and electron density of a plasma with use of triple probes; a circuit for detecting and holding a floating potential difference; a differential voltage adding circuit; a fixed voltage source; and a change-over switch, the apparatus being capable of determining a difference in the floating potentials at the position of said probes, and superimposing the potential difference determined on the fixed voltage.

REFERENCES:
patent: 2211124 (1940-08-01), Jakosky
patent: 3731187 (1973-05-01), Hausler et al.
patent: 3867687 (1975-02-01), Gealt
patent: 4242188 (1980-12-01), Niinomi et al.
patent: 4435681 (1984-03-01), Masuda et al.
patent: 4823087 (1989-04-01), Sugimori
patent: 5031125 (1991-07-01), Shimizu et al.
patent: 5198774 (1993-03-01), Williams, II et al.
N. Tsutsui, "Basic Plasma Engineering", pp. 167-183, Uchida-Rokakuho Co. May 30, 1986.

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