Triggering of an ESD NMOS through the use of an N-type...

Active solid-state devices (e.g. – transistors – solid-state diode – Regenerative type switching device – Device protection

Reexamination Certificate

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C257S355000, C257S356000, C257S360000

Reexamination Certificate

active

06855964

ABSTRACT:
An ESD NMOS structure with an odd number of N-type structures built into a P-type well. Buried N-type structures are positioned between the N-type structures. The center N-type structure and each alternate N-type structure are electrically connected to each other, to the buried N-type structures, and to the output contact; while the other N-type structures are electrically connected to each other and the P-well and to ground. When a positive ESD event occurs, a depletion zone is created in the P-well between the N-type buried structures and the N-type structures thereby increasing the resistivity of the structure. Moreover, when a positive ESD event occurs, the lateral NPN transistors on either side of the center N-type structure break down and snap back. The resulting current travels through the area of increased resistivity and thereby creates a larger voltage along the P-well from the center N-type structure out toward the distal N-type structures. The combination of the increased resistivity and the higher voltage act in combination to lower the triggering voltage of the ESD structure.

REFERENCES:
patent: 5019888 (1991-05-01), Scott et al.
patent: 5870268 (1999-02-01), Lin et al.
patent: 5932914 (1999-08-01), Horiguchi
patent: 6063672 (2000-05-01), Miller et al.
patent: 20010053054 (2001-12-01), Andoh
Notification of Transmittal of the International Search Report, dated Apr. 1, 2003.

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