Chemistry: electrical and wave energy – Apparatus – Vacuum arc discharge coating
Patent
1994-04-11
1995-08-15
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Vacuum arc discharge coating
20419238, 427580, C23C 1432
Patent
active
054416248
ABSTRACT:
An anodic vacuum arc deposition system for rapidly depositing a high quality, small grain size, coating on a workpiece. The anodic vacuum arc deposition system includes an arc initiator and an anodic electrode having a continuous feed. The anodic vacuum arc deposition system may be configured with a coaxial anode and cathode. A plurality of coaxial electrodes may used to deposition-coat a large area and/or to sequentially deposit a series of layers each of a different material. In one embodiment, a low current triggered anodic vacuum arc with a continuous wire feed mechanism provides the user with a self-contained high differential metal plasma spray. This apparatus provides coatings with properties similar to coatings from a basic anodic arc deposition source but can be self-ignited, continuously run, and made highly mobile for greater coverage control. An alternative embodiment of this device incorporates a cathodic arc source which supplies ions to both ignite the anodic arc and to enhance the ion population of the anodic arc metal flux for greater control over the deposition process via substrate biasing and magnetic focusing, and the degree of ionization at the substrate.
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Allen Ryne C.
Chan Chung
Xia Zhong-Yi
Northeastern University
Weisstuch Aaron
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