Trifluoromethyl-substituted compounds

Details Trifluoromethyl-substituted compounds Trifluoromethyl-substituted compounds

1975-10-01

1976-11-16

Sebastian, Leland A.

Chemistry of carbon compounds

Miscellaneous organic carbon compounds

C-metal

260429R, 2604292, 2604297, 260448A, C07F 500, C07F 506

Patent

active

039924246

ABSTRACT:
Trifluoromethyl-substituted compounds, are formed in a corona discharge or glow discharge plasma of trifluoromethyl radicals from an organic trifluoromethyl source. A substrate possessing easily replaceable ligands such as halogen or carbonyl, is initially contacted either in the plasma and within a short distance from a downstream visible edge of the plasma or outside of the visible portion of the plasma and within a short distance from the downstream visible edge, to effect a substitution of the halogen or carbonyl ligand on the substrate with a trifluoromethyl radical without substantial decomposition of the substrate.

REFERENCES:
patent: 3794671 (1974-02-01), Wilkinson
Jacob et al., Chem. Soc. Journal, Chemical Communications, 1973, No. 4, pp. 104-105.
Lagow et al., J. Am. Chem. Soc., vol. 97, pp. 518-522 (1975).

Affiliated with

Also associated with

Rating

Trifluoromethyl-substituted compounds does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Trifluoromethyl-substituted compounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Trifluoromethyl-substituted compounds will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-670596