Chemistry of inorganic compounds – Silicon or compound thereof – Halogen containing
Patent
1983-07-18
1985-07-02
Rutledge, L. Dewayne
Chemistry of inorganic compounds
Silicon or compound thereof
Halogen containing
423350, C01B 3302
Patent
active
045267693
ABSTRACT:
A process for producing trichlorosilane and equipment for practicing that process are disclosed. The process is a two stage process which combines the reaction of silicon tetrachloride and hydrogen with silicon with the reaction of hydrogen chloride with silicon. In one embodiment of the invention a two stage reactor is provided with a first stage heated to a temperature of about 500.degree.-700.degree. C. and a second stage maintained at a temperature of about 300.degree.-350.degree. C. Each of the first and second stages of the reactor are charged with silicon particles. A mixture comprising hydrogen and silicon tetrachloride are flowed through the silicon particles in the heated first stage to cause a partial hydrogenation of the silicon tetrachloride. The effluent from the first stage includes trichlorosilane and unreacted hydrogen and silicon tetrachloride. Hydrogen chloride is added to this effluent and the mixture of gases are passed through the silicon particles in the second stage of the reactor.
REFERENCES:
patent: 3148035 (1964-09-01), Enk
patent: 3681036 (1972-08-01), Schwarz et al.
patent: 4117094 (1978-09-01), Blocher, Jr. et al.
Mui, J. Y. P., "Investigation of the Hydrochlorination of SiCl.sub.4 ", Final Report, Jet Propulsion Lab, Cal. Inst. Tech., Contract No. 956061, Apr. 1983.
Ingle William M.
Peffley Marilyn S.
Setty H. S. Nagaraja
Brody Christopher W.
Fisher John A.
Motorola Inc.
Rutledge L. Dewayne
LandOfFree
Trichlorosilane production process does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Trichlorosilane production process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Trichlorosilane production process will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-380707