Optics: measuring and testing – By light interference – For dimensional measurement
Reexamination Certificate
2007-11-06
2007-11-06
Turner, Samuel A. (Department: 2877)
Optics: measuring and testing
By light interference
For dimensional measurement
C356S511000
Reexamination Certificate
active
10941622
ABSTRACT:
An optical system includes a photolithography system, a low coherence interferometer, and a detector. The photolithography system is configured to illuminate a portion of an object with a light pattern and has a reference surface. The low coherence interferometer has a reference optical path and a measurement optical path. Light that passes along the reference optical path reflects at least once from the reference surface and light that passes along the measurement optical path reflects at least once from the object. The detector is configured to detect a low coherence interference signal including light that has passed along the reference optical path and light that has passed along the measurement optical path. The low coherence interference signal is indicative of a spatial relationship between the reference surface and the object.
REFERENCES:
patent: 4355903 (1982-10-01), Sandercock
patent: 4576479 (1986-03-01), Downs
patent: 4618262 (1986-10-01), Maydan et al.
patent: 4660980 (1987-04-01), Takabayashi et al.
patent: 4794550 (1988-12-01), Greivenkamp, Jr.
patent: 4818110 (1989-04-01), Davidson
patent: 4999014 (1991-03-01), Gold et al.
patent: 5042949 (1991-08-01), Greenberg et al.
patent: 5042951 (1991-08-01), Gold et al.
patent: 5112129 (1992-05-01), Davidson et al.
patent: 5129724 (1992-07-01), Brophy et al.
patent: 5133601 (1992-07-01), Cohen et al.
patent: 5135307 (1992-08-01), de Groot et al.
patent: 5301010 (1994-04-01), Jones et al.
patent: 5398113 (1995-03-01), de Groot
patent: 5459564 (1995-10-01), Chivers
patent: 5489986 (1996-02-01), Magome et al.
patent: 5587792 (1996-12-01), Nishizawa et al.
patent: 5589938 (1996-12-01), Deck
patent: 5602643 (1997-02-01), Barrett
patent: 5774224 (1998-06-01), Kerstens
patent: 5900633 (1999-05-01), Solomon et al.
patent: 5973784 (1999-10-01), Szwaykowski et al.
patent: 6242739 (2001-06-01), Cherkassky
patent: 6249351 (2001-06-01), de Groot
patent: H1972 (2001-07-01), Inoue
patent: 6259521 (2001-07-01), Miller et al.
patent: 6377349 (2002-04-01), Fercher
patent: 6500591 (2002-12-01), Adams
patent: 6507405 (2003-01-01), Grek et al.
patent: 6545761 (2003-04-01), Aziz et al.
patent: 6545763 (2003-04-01), Kim et al.
patent: 6597460 (2003-07-01), Groot et al.
patent: 6636322 (2003-10-01), Terashita
patent: 6674510 (2004-01-01), Jasper et al.
patent: 6721094 (2004-04-01), Sinclair et al.
patent: 6940604 (2005-09-01), Jung et al.
patent: 2002/0135775 (2002-09-01), De Groot et al.
patent: 2002/0196450 (2002-12-01), Olszak et al.
patent: 2003/0112444 (2003-06-01), Yang et al.
patent: 2004/0085544 (2004-05-01), de Groot et al.
patent: 2004/0189999 (2004-09-01), de Groot et al.
patent: 2005/0057757 (2005-03-01), de Lega et al.
patent: 2005/0073692 (2005-04-01), de Groot et al.
patent: 2005/0078318 (2005-04-01), de Groot
patent: 2005/0078319 (2005-04-01), de Groot
patent: 2005/0088663 (2005-04-01), de Groot et al.
patent: 2005/0146727 (2005-07-01), Hill
patent: 2005/0237534 (2005-10-01), Deck
patent: 2006/0012582 (2006-01-01), de Lega
patent: 4108944 (1992-09-01), None
patent: 4309056 (1994-09-01), None
patent: 0 397 388 (1990-11-01), None
patent: 0 549 166 (1993-06-01), None
patent: 0 617 255 (1994-09-01), None
patent: 0 929 094 (1999-07-01), None
patent: 2385417 (2003-08-01), None
patent: WO 97/44633 (1997-11-01), None
patent: WO 02/082008 (2002-10-01), None
patent: WO 03/062802 (2003-07-01), None
patent: WO 2004/023071 (2004-03-01), None
Berman et al., “Review of In Situ & In-line Detection for CMP Applications”,Semiconductor Fabtech—8thEdition, pp. 267-274, (1998).
Kujawinska, Malgorzata, “5 Spatial Phase Measurement Methods”,Interferogram Analysis: Digital Fringe Pattern Measurement Techniques, pp. 141-193, (1993).
Ngoi et al., “Phase-shifting interferometry immune to vibration”,Applied Optics, vol. 40:19, pp. 3211-3214 (2001).
C. Akcay et al., “Spectral shaping to improve the point spread function in optical coherence tomography”,Optics Letters, vol. 28 No. 20, pp. 1921-1923 (Oct. 15, 2003).
R.M.A. Azzam et al., “Reflection and Transmission of Polarized Light by Stratified Planar Structures”,Ellipsometry and Polarized Light, Elsevier Science B.V. ISBN 0 444 87016 4 (Paperback) pp. 267-363 (1987).
R.M.A. Azzam et al, “Ellipsometric function of a film-substrate system: Applications to the design of reflection-type optical devices and to ellipsometry”,Journal of the Optical Society of America, vol. 5, No. 3, pp. 252-260, (1975).
M. Bashkansky et al., “Signal Processing for Improving Field Cross-correlation Function in Optical Coherence Tomography”,Supplement to Optics&Photonics News, 9(5) (May, 1998).
A. Bosseboeuf et al., “Application of microscopic interferometry techniques in the MEMS field”,Proceedings of SPIE, vol. 5145, pp. 1-16 (2003).
M. Davidson et al., “An Application of Interference Microscopy to Integrated Circuit Inspection and metrology”,Proceedings SPIE, vol. 775, pp. 233-247 (1987).
T. Dresel et al., “Three-dimensional sensing of rough surfaces by coherence radar”,Applied Optics, vol. 31, No. 7, pp. 919-925 (Mar. 1, 1992).
J.E. Greivenkamp, “Generalized data reduction for heterodyne interferometry”,Optical Engineering., vol. 23 No. 4, pp. 350-352 (Jul./Aug. 1984).
P de Groot et al., “Signal modeling for low coherence height-scanning interference microscopy”,Applied Optics, vol. 43 No. 25, pp. 4821-4830 (Sep. 1, 2004).
P. de Groot, “Derivation of algorithms for phase-shifting interferometry using the concept of a data-sampling window”,Appl. Opt., 34(22), p. 4723-4730 (1995).
P. de Groot et al., “Signal modeling for modern interference microscopes”,SPIE Proceedings, 5457-4 (2004).
Peter de Groot et al., “Determination of fringe order in white-light interference microscopy”,Appl. Opt., 41(22) pp. 4571-4578 (2002).
Feke, Gilbert D. et al., “Interferometric back focal plane microellipsometry”,Applied Optics, vol. 37, No. 10, pp. 1796-1802 (Apr. 1, 1998).
P.A. Flournoy et al., “White-light interferometric thickness gauge”,Appl. Opt., 11(9), pp. 1907-1915 (1972).
G. Hausler et al., “Coherence Radar and Spectral Radar—New Tools for Dermatological Diagnosis”,Journal of Biomedical Optics, vol. 3, No. 1, pp. 21-31 (Jan. 1998).
R.D. Holmes et al., “Scanning microellipsometry for extraction of true topograpy”,Electronics Letters, vol. 31, No. 5, pp. 358-359 (Mar. 2, 1995).
Kim, Seung-Woo et al., “Thickness-profile measurement of transparent thin-film layers by white-light scanning interferometry”,Applied Optics, vol. 38, No. 28, pp. 5968-5973 (Oct. 1, 1999).
Kino, Gordon S. et al., “Mirau correlation microscope”,Applied Optics, vol. 29, No. 26, pp. 3775-3783 (Sep. 10, 1990).
Kieran G. Larkin, “Efficient nonlinear algorithm for envelope detection in white light interferometry”,Journal of the Optical Society of America A, vol. 13, No. 4, pp. 832-843 (1996).
Lee et al., “Profilometry with a coherence scanning microscope”,Appl. Opt., 29(26), pp. 3784-3788 (1990).
I. Lee-Bennett, “Advances in non-contacting surface metrology”,OF&T Workshop, papter OTuC1 (2004).
K. Leonhardt et al., “Micro-Ellipso-Height-Profilometry”,Optics Communications, vol. 80, No. 3, 4, pp. 205-209 (Jan. 1, 1991).
Y. Liu et al., “Common path interferometric microellipsometry”,SPIE, vol. 2782, pp. 635-645 (1996).
Lyakin et al., “The interferometric system with resolution better than coherence length for determination of geometrical thickness and refractive index of a layer object”,Proceedings of the SPIE—The International Society for Optical Engineering SPIE-INT. Soc. Opt. Eng USA, vol. 4956, pp. 163-169 (Jul. 2003).
C.J. Morgan, “Least-Squares estimation in phase-measurement interferometry”,Optics Letters, 7(8), pp. 368-370 (1982).
A.V. Oppenheim
Colonna De Lega Xavier
De Groot Peter J.
Fish & Richardson P.C.
Turner Samuel A.
Zygo Corporation
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