Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle
Reexamination Certificate
2011-04-19
2011-04-19
Dinh, Paul (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
C716S051000, C716S054000, C716S055000
Reexamination Certificate
active
07930653
ABSTRACT:
The present disclosure relates to fracturing of polygon data, with one application being microlithography. In particular, it relates to preserving data regarding edges and/or vertices of the original polygons as the polygons are triangulated and even if the results of triangulation are further fractured.
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Ivansen Lars
Österberg Anders
Beffel, Jr. Ernest J.
Dinh Paul
Haynes Beffel & Wolfeld LLP
Micronic Laser Systems AB
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