Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Passive components in ics
Reexamination Certificate
2006-10-31
2006-10-31
Owens, Douglas W. (Department: 2811)
Active solid-state devices (e.g., transistors, solid-state diode
Integrated circuit structure with electrically isolated...
Passive components in ics
C257S528000, C336S200000
Reexamination Certificate
active
07129561
ABSTRACT:
A high performance inductor which has a relatively low sheet resistance that can be integrated within a semiconductor interconnect structure and can be used in RF applications, including RF CMOS and SiGe technologies, is provided. The inductor is either a dual-metal inductor including a first layer of metal which serves as an upper metal wire in the semiconductor structure and a second layer of metal located directly on top of the first layer of metal, or a tri metal inductor, which includes a third layer of metal located directly on top of the second layer of metal. No vias are located between the various metal layers of the inventive inductor.
REFERENCES:
patent: 5446311 (1995-08-01), Ewen et al.
patent: 5656849 (1997-08-01), Burghartz et al.
patent: 6124624 (2000-09-01), Van Roosmalen et al.
patent: 6287931 (2001-09-01), Chen
patent: 6287932 (2001-09-01), Forbes et al.
patent: 6395637 (2002-05-01), Park et al.
patent: 6639298 (2003-10-01), Chaudhry et al.
patent: 2001/0025153 (2001-09-01), Farrar et al.
patent: 2002/0011653 (2002-01-01), Ferrari et al.
patent: 2002/0017699 (2002-02-01), Shenoy
patent: 2002/0101322 (2002-08-01), Liu et al.
patent: 2002/0125575 (2002-09-01), Chaen
Coolbaugh Douglas D.
Edelstein Daniel C.
Groves Robert A.
He Zhong-Xiang
Gebremariam Samuel
Owens Douglas W.
Sabo, Esq. William D.
Scully , Scott, Murphy & Presser, P.C.
LandOfFree
Tri-metal and dual-metal stacked inductors does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Tri-metal and dual-metal stacked inductors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Tri-metal and dual-metal stacked inductors will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3647473