Chemistry of inorganic compounds – Sulfur or compound thereof – Binary compound
Reexamination Certificate
2011-08-02
2011-08-02
Vanoy, Timothy C (Department: 1734)
Chemistry of inorganic compounds
Sulfur or compound thereof
Binary compound
Reexamination Certificate
active
07988943
ABSTRACT:
For conversion of sulphur-containing compounds present in a gas comprising H2S and sulphur-containing compounds into additional H2S, a step A of contacting the gas with a reducing gas and a hydrogenation catalyst comprising cobalt, molybdenum and an alumina support, the sum of cobalt and molybdenum, in the oxide form, being 3% to 25% by weight, the surface area of alumina being more than 140 m2/g. In step B, effluent gas from step A is contacted with a catalyst comprising at least one alkaline-earth element, at least one dopant being iron, cobalt or molybdenum and at least one compound of titanium oxide and/or zirconium oxide, the catalyst for step B) being either in bulk or supported.
REFERENCES:
patent: 4399112 (1983-08-01), Voirin
patent: 4532119 (1985-07-01), Dupin
patent: 5106607 (1992-04-01), Chopin et al.
patent: 2008/0279759 (2008-11-01), Van Den Brand et al.
patent: 2009/0004070 (2009-01-01), Chow et al.
patent: 1 442 781 (2004-08-01), None
patent: 2 481 254 (1981-10-01), None
patent: WO 94/11105 (1994-05-01), None
patent: WO 98/07502 (1998-02-01), None
patent: WO 2005/113429 (2005-12-01), None
International Search Report of PCT/FR2008/001524 (Jun. 19, 2009).
Nedez Christophe
Roisin Eric
IFP Energies Nouvelles
Millen White Zelano & Branigan P.C.
Vanoy Timothy C
LandOfFree
Treatments of tail gas from a claus unit over an optimized... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Treatments of tail gas from a claus unit over an optimized..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Treatments of tail gas from a claus unit over an optimized... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2644575