Treatment tank in photosensitive material processing system incl

Details Treatment tank in photosensitive material processing system incl Treatment tank in photosensitive material processing system incl

1985-07-29

1987-02-10

Mathews, A. A.

354331, G03D 302

Patent

active

046419411

ABSTRACT:
A treatment tank in photosensitive material processing system or the like is equipped with a plurality of overflow devices and a partition member for separating liquid surface part extending at least to one overflow device from the other, below the liquid surface with at least one opening or gap allowing the treatment liquid to flow from side of the partition, and with the partition member solution in the middle and deep region of the tank passes through the opening or gap to flow over insoluble solids being suspended therein.

REFERENCES:
patent: 3626832 (1971-12-01), Kappeler
patent: 4252429 (1981-02-01), Hope et al.
patent: 4269209 (1981-05-01), Peterson
patent: 4312586 (1982-01-01), Ohtani
Kimmel et al, "Research Disclosure 21116", Nov. 1981, pp. 411 and 412, Eastman Kodak.

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