Chemical apparatus and process disinfecting – deodorizing – preser – Physical type apparatus – Means separating or dissolving a material constituent
Patent
1992-03-10
1993-05-25
Warden, Robert J.
Chemical apparatus and process disinfecting, deodorizing, preser
Physical type apparatus
Means separating or dissolving a material constituent
210138, 210143, 210188, 422116, 42218607, 4221861, 422305, B01D 1104
Patent
active
052137732
ABSTRACT:
A liquid treatment system receives untreated liquid from a pressurized source and outputs treated liquid on demand. An ozone containing gas from a generator is combined with untreated liquid to accomplish the desired treatment before the liquid is output; and the necessary operations include pumping, venting, a demand event switch, and a control system to accomplish the necessary functions. A valved liquid passageway conducts untreated liquid to a contact region, accumulated gas is vented from the system. A demand event can be manual operation of an output switch or manual operation of an outflow valve that causes a liquid level change within the system. Treated liquid outflow can occur by gravity, as a passive outflow in response to opening an inflow valve, and as an active outflow driven by a pump.
REFERENCES:
patent: 3382980 (1968-05-01), Silva
patent: 3445001 (1969-05-01), LaRaus
patent: 3699776 (1972-10-01), LaRaus
patent: 3823728 (1974-07-01), Burris
patent: 4555335 (1985-11-01), Burris
patent: 4599166 (1986-07-01), Gesslauer
patent: 4619763 (1986-10-01), O'Brien
patent: 4767525 (1988-08-01), Campbell et al.
patent: 4767528 (1988-08-01), Sasaki et al.
patent: 4842723 (1989-06-01), Parks et al.
Thornton Krisanne M.
Warden Robert J.
LandOfFree
Treatment of liquid on demand does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Treatment of liquid on demand, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Treatment of liquid on demand will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-895830