Treatment of allergic contact dermatitis

Details Treatment of allergic contact dermatitis Treatment of allergic contact dermatitis

1993-06-01

1996-11-26

Webman, Edward J.

Drug, bio-affecting and body treating compositions

Solid synthetic organic polymer as designated organic active...

424484, 424486, 424443, 514862, A61K 3340, A61K 3839, A61K 31725, A61K 970

Patent

active

055783007

ABSTRACT:
A method of treatment of allergic contact dermatitis, which comprises treating a patient with a formulation capable of inducing oxidative stress and a heat shock response so as to convert the allergic reaction of the allergic contact dermatitis to an irritant reaction.

REFERENCES:
patent: 4009282 (1977-02-01), Vorhees
patent: 4438102 (1984-03-01), Ganci
patent: 4990339 (1991-02-01), Scholl et al.
Picardo et al., Biosis (File 5) Accession No. 9402891 and British J. Dermatol., 126(5):450-455, Abstract (1992).
Burdon et al. (1990) in Stress Proteins, Induction and Function, "Active Oxygen Species and Heat Shock Protein Induction", pp. 19-25.
Santoro et al. (1990) in Stress Proteins. Induction and Function, "Induction of HSP70 by Prostaglandins", pp. 27-44.
Miya et al. (1980) International J. of Biological Macromolecules, "I.r. Spectroscopic Determination of CONH Content in Highly Deacylated Chitosan", 2:323-324.
Sannan et al. (1978) Polymer, "Studies on Chitin:7.l.r. Spectroscopic Determination of Degree of Deacetylation", 19:458-459.
Boveris (1977) Analytical Biochemistry, "Evaluation of Horseradish Peroxidase-Scopoletin Method for Measurement of Hydrogen Peroxide Formation in Biological Systems", 80:145-158.

Affiliated with

Also associated with

Rating

Treatment of allergic contact dermatitis does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Treatment of allergic contact dermatitis, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Treatment of allergic contact dermatitis will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1971109