Treatment liquid supply system

Details Treatment liquid supply system Treatment liquid supply system

2007-02-13

2007-02-13

Menon, Krishnan S. (Department: 1723)

Liquid purification or separation

Flow, fluid pressure or material level, responsive

C210S406000, C210S257100, C239S303000, C239S308000, C239S310000, C239S311000, C239S318000, C239S335000, C239S337000, C239S346000

Reexamination Certificate

active

10671219

ABSTRACT:
In a treatment liquid supply system that supplies treatment liquid used for coating industrial objects for film formation including a semiconductor substrate, a display substrate, a glass and the like, a nozzle connected to a treatment liquid tank vacuum-sucks and injects the treatment liquid from the treatment liquid tank due to a negative pressure occurring in the nozzle, wherein supply control of a small flow amount of the treatment liquid to the nozzle can be performed due to a difference pressure between pressure in the treatment liquid tank and the negative pressure occurring in the nozzle.

REFERENCES:
patent: 817219 (1906-04-01), Walkup
patent: 1488125 (1924-03-01), Kline
patent: 3595481 (1971-07-01), Enblom
patent: 3618862 (1971-11-01), Bell et al.
patent: 4526191 (1985-07-01), Pomponi, Jr.
patent: 287456 (1914-04-01), None
patent: 60 206460 (1985-10-01), None

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