Treatment device utilizing plasma

Details Treatment device utilizing plasma Treatment device utilizing plasma

1984-04-04

1985-07-02

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118 501, 118620, 118730, 156643, 156646, 204192E, 204298, H01L 21306, B44C 122, C03C 1500, C03C 2506

Patent

active

045266441

ABSTRACT:
A treatment device utilizing plasma performs treatment by exposing a material to be treated to a plasma atmosphere formed by converting at least either one of fluorine and a fluorine compound into gas plasma, and said device comprises a structural member for forming the space for maintaining said plasma atmosphere, which is constituted of a stainless steel structure member coated on its surface exposed to said plasma atmosphere with a metal film which can difficultly form a fluoride.

REFERENCES:
patent: 4243506 (1981-01-01), Ikeda et al.
patent: 4368092 (1983-01-01), Steinberg et al.
patent: 4424096 (1984-01-01), Kumagai

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