Cleaning and liquid contact with solids – Apparatus – With plural means for supplying or applying different fluids...
Patent
1998-03-06
2000-05-16
Coe, Philip R.
Cleaning and liquid contact with solids
Apparatus
With plural means for supplying or applying different fluids...
134 953, 134153, 134902, B08B 302
Patent
active
060622407
ABSTRACT:
A treatment device comprising a holding method for holding a substrate such as an LCD substrate; and a treatment solution supply method for supplying a treatment solution on a surface of the substrate wherein the holding method has a substrate-placing portion on which the substrate is disposed, the substrate-placing is made of a synthetic resinous material. Since the holding method has a substrate-placing portion which is made of a synthetic resinous material, the electric charge amount of the substrate can be reduced to prevent various static electricity caused troubles such as the electrostatic destruction of the device formed on the substrate. Further, a discharge noise trouble due to discharge phenomenon from the substrate to a transporting method can be prevented. Further, it is possible to reduce the electric charge amount of the holding method and destaticize the holding method by supplying a destaticizing fluid such as ionized pure water or ionized gas towards above or below the holding method. Thus, it is possible to prevent various static-electricity caused troubles such as the electrostatic destruction of the device formed in the device from occurring and further, possible to prevent noise troubles from occurring because the generation degree of the discharge which occurs between the substrate and the transport method can be reduced further. The electric charge amount of the substrate can be reduced by making the thickness (distance) of the substrate-placing portion formed of a dielectric thick (long).
REFERENCES:
patent: 4564280 (1986-01-01), Fukuda
patent: 4735220 (1988-04-01), Chandler
patent: 5211753 (1993-05-01), Swain
patent: 5351360 (1994-10-01), Suzuki et al.
Sada Tetsuya
Sakai Mitsuhiro
Uchihira Norio
Yamaguchi Kiyomitsu
Coe Philip R.
Tokyo Electron Limited
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