Treatment basin for semiconductor material

Details Treatment basin for semiconductor material Treatment basin for semiconductor material

1985-08-06

1988-06-28

Hornsby, Harvey C.

Cleaning and liquid contact with solids

Apparatus

With movable means to cause fluid motion

134198, 134 99, B08B 304

Patent

active

047532580

ABSTRACT:
This disclosure includes an improvement relating to a square basin for applying a treatment such as etching, development, plating or washing to surfaces of semiconductor materials housed in a carrier which is supported in the basin, by a treatment liquid introduced upwardly through a passage formed in the bottom portion of the basin and then overflown at a top periphery of the basin. The improvement exists in the formation of two rows of holes in the bottom portion of the basin. These holes are adapted to discharge a treatment liquid in an inward-upward direction so as to cause a up and down swirling in the treatment liquid in the basin. This obviates local or partial stagnations of treatment liquid in the basin and effects a treatment.

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IBM Tech. Disclosure Bulletin, vol. 13, No. 8, Jan. 1971, G. E. Melvin et al.

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