Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1995-08-21
1998-03-17
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429806, 20429808, 20429814, 20429819, 20419212, C23C 1434
Patent
active
057282765
ABSTRACT:
In a treatment apparatus, a collimator is insulated electrically from the other equipment to be rendered electrically floating, and also the potential of the collimator is variably controllable by a variable DC power source. Therefore, the thickness in plane of the layer to be produced can be uniformalized by controlling the voltage applied to the collimator, without changing both layout and figure of the hardware, e.g., permanent magnet, without process, and further without both beginning and end of a target.
REFERENCES:
patent: 3669860 (1972-06-01), Knowles et al.
patent: 4006073 (1977-02-01), Welch
patent: 4824544 (1989-04-01), Mikalesen et al.
patent: 4963239 (1990-10-01), Shimamura et al.
patent: 5114556 (1992-05-01), Lamont, Jr.
patent: 5133849 (1992-07-01), Kinoshita
patent: 5403459 (1995-04-01), Guo
Katsuki Jiro
Kobayashi Hiroshi
Wada Yuichi
McDonald Rodney G.
Nguyen Nam
Tel Varian Limited
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