Photography – Fluid-treating apparatus – Having fluid-circulating means
Patent
1997-02-21
1998-06-09
Rutledge, D.
Photography
Fluid-treating apparatus
Having fluid-circulating means
396627, 396611, G03D 302
Patent
active
057650721
ABSTRACT:
A substrate treating apparatus includes a substrate treating station for performing a predetermined treatment of substrates by supplying a predetermined treating solution to the substrates, and at least one treating solution supply mechanism for supplying the treating solution in a forced feed under gas pressure to the substrate treating station. The solution supply mechanism has a treating solution storage tank, a pressurizing mechanism, a pressure release mechanism and a valve for selectively allowing and stopping supply of the treating solution. The storage tank begins to be pressurized a predetermined time before the treating solution is supplied to a first substrate in a lot including a plurality of substrates to be treated successively with the same solution. Pressure is released from the storage tank based on a time at which the treating solution is stopped being supplied to a last substrate in the lot or at a predetermined slightly later time. Such control is effected lot by lot. Gas dissolution in the treating solution is reduced without using an expensive gas which would result in high running cost.
REFERENCES:
patent: 4286541 (1981-09-01), Blackwood
patent: 5555234 (1996-09-01), Sugimoto
patent: 5625433 (1997-04-01), Inada et al.
Fukutomi Yoshiteru
Ohtani Masami
Dainippon Screen Mfg. Co,. Ltd.
Rutledge D.
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