Treating device

Details Treating device Treating device

1993-12-01

1995-01-03

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, 118722, 118725, 414217, 414938, C23C 1600

Patent

active

053782836

ABSTRACT:
A treating device of the closed system structure in which semiconductor wafers are conveyed from a load lock chamber to a process tube comprises a gas feed pipe for feeding inert gas into a load lock chamber, and a gas circulating cleaning system which lets out the inert gas in the load lock chamber, removes gaseous impurity and particulate impurities in the let out gas by a gas cleaning filter, and returns the cleaned gas into the load lock chamber. Thus, ambient atmosphere of the inert gas in the load lock chamber can be maintained at high purity, a consumption amount of the inert gas can be small, which contributes to suppression of generation of particles and preclusion of chemical contamination. The treating device can have high achievement and can be economical.

REFERENCES:
patent: 4883020 (1989-11-01), Kasai
patent: 5303671 (1994-04-01), Kondo

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