Trap for capturing waste by-product generated by a chemical vapo

Details Trap for capturing waste by-product generated by a chemical vapo Trap for capturing waste by-product generated by a chemical vapo

1997-09-29

2000-05-16

Silbaugh, Jan H.

Coating apparatus

Gas or vapor deposition

34 72, 554342, 62642, B01D 800

Patent

active

06063197&

ABSTRACT:
A chemical vapor deposition system including a chemical vapor deposition chamber, an inlet line for directing reactant gases into the deposition chamber, and outlet line for discharging waste by-product from the deposition chamber, and a detachable trap position along the outlet line for trapping at least a portion of the waste by-product. The trap can include an array of baffles for increasing the surface area within the trap and disrupting flow within the trap. The trap can also include cooling structure for cooling at least a portion of the trap to enhance waste by-product deposition within the trap.

REFERENCES:
patent: 2728632 (1955-12-01), Matheson
patent: 3785162 (1974-01-01), Long et al.
patent: 5488833 (1996-02-01), Stewart
patent: 5556473 (1996-09-01), Olson et al.
patent: 5607511 (1997-03-01), Meyerson
patent: 5626651 (1997-05-01), Dullien
"Precision 5000 CVD: Systems Manual Part 5000-10-01," Section 3, p.1-6, 29-30 and 34-35, Section 6, p. 3, Applied Materials, Copyright 1987.

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